| 摘要 |
Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 mum on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot. |
