APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING DOUBLE CHAMBER WALL

摘要

PURPOSE: An apparatus for fabricating a semiconductor device is to form a wall of a chamber into a double wall having a hollow portion therein, thereby preventing loss of radiant heat generated from a heater. CONSTITUTION: A semiconductor device fabricating process is performed in a reaction chamber(110). A vacuum pump discharges gas in the reaction chamber. The reaction chamber and the vacuum pump are connected through a chamber discharging pipe(140). A heater(130) is disposed in the reaction chamber to supply heat for the semiconductor device fabricating process. The reaction chamber has a double wall(115) in which a hollow portion is formed, and a double wall discharging pipe(150) for discharging the gas in the double wall. The double wall discharging pipe is connected with the chamber discharging pipe to discharge the gas in the double wall by the vacuum pump. A pressure gauge(150b) is provided to detect pressure in the double wall. The semiconductor device fabricating process is performed by CVD.