SPINNER-STEPPER APPARATUS

摘要

PURPOSE: A spinner-stepper apparatus is provided to reduce an area occupied by the equipment by transferring a wafer by using only an interface of a stepper, and to perform a precise process by making the interface synchronize with the process. CONSTITUTION: A spinner(210) applies and develops a predetermined layer on a wafer. An exposure process is performed regarding the wafer applied and developed in the spinner to corrode a pattern. A single interface(230) transfers the wafer between the spinner and a stepper(220). The single interface includes a buffer and a robotic system. The buffer is supplied in the stepper, and stacks the wafer. The robotic system selectively transfers the wafer in the buffer to the spinner and the stepper.