发明名称 SUBSTRATE SUPPORT HEAD FOR MECHANICAL AND CHEMICAL POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent a carrier error of a substrate at the time of supporting the substrate on a support plate. SOLUTION: This substrate support head 8 is furnished with a housing 9, a base 10 connected to this housing 9, a holding ring 17 fixed on an outer peripheral part of this base 10 and a disc type support plate 20 arranged on the inside of this holding ring 17. A projected part 24 for supporting of a ring shape is provided on a peripheral edge part of a lower surface of the support plate 20. This projected part 24 for supporting is formed from a peripheral edge of the support plate 20 to a position corresponding to an outside side surface forming a ring groove 22. An edge part of a wafer W including an orientation flat part is held through a flexible film 25 on the projected part 24 for supporting along an overall periphery in the case of supporting the wafer W having the orientation flat on the support plate 20.
申请公布号 JP2001079758(A) 申请公布日期 2001.03.27
申请号 JP19990241223 申请日期 1999.08.27
申请人 APPLIED MATERIALS INC 发明人 ODEMIZU MAMIO
分类号 B24B37/04;B24B37/30;H01L21/304 主分类号 B24B37/04
代理机构 代理人
主权项
地址