发明名称 FILM DEPOSITION DEVICE AND FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a film deposition device capable of obtaining various film composition and film constitutions, capable of efficiently producing a desired thin film in a short time and capable of easily depositing a thin film having a gradient refractive index and to provide a film deposition method using the film deposition device. SOLUTION: A film deposition device 1 has chamber 2, a holding part 4 holding a substrate 3, a film thickness gauge 5, a shutter 6, a first material feeding source 7, a second material feeding source 8, a driving system 11, a control means 12 and a guide member 15. The first material feeding source 7 is a fixed material feeding source fixed to the bottom part of the chamber 2, and the second material feeding source 2 is a movable material feeding source movable by the driving system 11.
申请公布号 JP2001081558(A) 申请公布日期 2001.03.27
申请号 JP19990259477 申请日期 1999.09.13
申请人 ASAHI OPTICAL CO LTD 发明人 FUJII HIDEO
分类号 G02B1/10;C23C14/54 主分类号 G02B1/10
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