发明名称 |
Ion beam implantation using conical magnetic scanning |
摘要 |
Method and apparatus for use in treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. Ions emitted by an ion source are accelerated away from the ion source to form an ion beam. A magnetic field is created for intercepting the ions in the ion beam exiting the source and selectively deflectiing the ions away from an initial trajectory in a generally arcuate scanning motion. The magnetic field is created by synchronized energization of first and second current carrying coils located along an inner surface of a ferromagnetic support. The beam is deflected away from the initial trajectory by a controlled amount in a time varying manner to cause the beam to sweep through an arcuate path and impact the workpiece.
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申请公布号 |
US6207963(B1) |
申请公布日期 |
2001.03.27 |
申请号 |
US19980219669 |
申请日期 |
1998.12.23 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
BENVENISTE VICTOR M. |
分类号 |
C23C14/48;H01J37/147;H01J37/317;H01L21/265;(IPC1-7):H01J37/317 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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