发明名称 MACHINING METHOD USING CONVERGENT ION BEAM
摘要 PROBLEM TO BE SOLVED: To shorten the time required for sputter-etching by projecting convergent ion beams of a plurality of convergent ion beam lens-barrels to a sample at the same time. SOLUTION: Two convergent ion beam lens-barrels are fitted to a sample chamber 23. A first convergent ion beam lens-barrel 21 is set at such position as a sample 25 which is horizontally set is irradiated with vertical ion beam. A second convergent ion beam lens-barrel 22 is set at a different angle, for example tilted by 60 deg.. The centers of ion beams of convergent ion beam lens- barrels cross each other on the surface of sample 25 placed on a sample stage 24. By setting the height of a sample surface to the cross point of convergent ion beams, the projection point of convergent ion beams of two convergent ion beam lens-barrels is at the same position on the sample surface.
申请公布号 JP2001077058(A) 申请公布日期 2001.03.23
申请号 JP19990254914 申请日期 1999.09.08
申请人 SEIKO INSTRUMENTS INC 发明人 NISHIMURA TETSUJI;FUJII TOSHIAKI;SUGIYAMA YASUHIKO
分类号 H01L21/302;H01J37/30;(IPC1-7):H01L21/302 主分类号 H01L21/302
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