发明名称 |
MACHINING METHOD USING CONVERGENT ION BEAM |
摘要 |
PROBLEM TO BE SOLVED: To shorten the time required for sputter-etching by projecting convergent ion beams of a plurality of convergent ion beam lens-barrels to a sample at the same time. SOLUTION: Two convergent ion beam lens-barrels are fitted to a sample chamber 23. A first convergent ion beam lens-barrel 21 is set at such position as a sample 25 which is horizontally set is irradiated with vertical ion beam. A second convergent ion beam lens-barrel 22 is set at a different angle, for example tilted by 60 deg.. The centers of ion beams of convergent ion beam lens- barrels cross each other on the surface of sample 25 placed on a sample stage 24. By setting the height of a sample surface to the cross point of convergent ion beams, the projection point of convergent ion beams of two convergent ion beam lens-barrels is at the same position on the sample surface.
|
申请公布号 |
JP2001077058(A) |
申请公布日期 |
2001.03.23 |
申请号 |
JP19990254914 |
申请日期 |
1999.09.08 |
申请人 |
SEIKO INSTRUMENTS INC |
发明人 |
NISHIMURA TETSUJI;FUJII TOSHIAKI;SUGIYAMA YASUHIKO |
分类号 |
H01L21/302;H01J37/30;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|