METHOD OF FORMING A CONDUCTIVE PATTERN ON DIELECTRIC SUBSTRATES

摘要

The aim of the invention is to produce a conductor pattern on dielectric substrates. According to the inventive method a) a substrate that is coated with a metal layer is coated with a protective layer which is produced by treating the metal layer with a solution containing at least one compound which contains nitrogen; b) the protective layer is at least partially remov ed by means of UV radiation in the areas that do not correspond to the conducto r pattern in such a way that the metal layer is uncovered, whereby said conductor pattern is to be produced and c) the uncovered metal layer is subsequently removed by etching. Extremely fine conductor patterns can be produced on dielectric substrates in a reproducible manner by means of the inventive method.