发明名称 A METHOD AND AN APPARATUS FOR PLASMA TREATING THE SURFACE OF SUBSTRATES
摘要 Plasma surface treatment process comprises plasma coating a substrate (S1) in a treatment chamber (1) while pre-treating the next substrate (S2) outside the chamber. An Independent claim is also included for equipment for carrying out the above process, comprising an evacuated treatment chamber (1) containing a plasma spray unit (10) and one or more pretreatment chambers (2, 3) containing a plasmatron (20, 30).
申请公布号 SG79289(A1) 申请公布日期 2001.03.20
申请号 SG19990005452 申请日期 1999.11.03
申请人 SULZER METCO AG 发明人 KELLER, SILVANO
分类号 C23C4/00;C23C4/12;C23C8/36;C23C14/02;C23C14/54 主分类号 C23C4/00
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