发明名称 SUBSTRATE, TRANSFER METHOD, HOUSING DEVICE AND HOUSING BOX
摘要 PURPOSE: A substrate transfer device is provided to reduce as little as possible the space needed for cleaning of the transfer area of a glass substrate in the substrate transfer device. CONSTITUTION: With a glass substrate, which is provided as a treatment object and supported in the interior of a housing box(50) formed into a box type, air flow to flow from the sides of the surfaces, which is opposed to the formed surface of a substrate gateway(51) of the gateway(51) to the outside through the gateway(51) is formed by blast fans(49). Because of this, even though the gateway(51) is always open, particles floating outside of the box(50) will not infiltrate into the box(50). Accordingly, the need for keeping the transfer area of the glass substrate in a clean environment is eliminated, and the forming cost of the clean environment can be reduced. Moreover, since the gateway(51) is always open and an opening and shutting mechanism for opening and shutting the gateway(51) is not provided, delivery of the substrate can be performed rapidly.
申请公布号 KR20010021000(A) 申请公布日期 2001.03.15
申请号 KR20000033210 申请日期 2000.06.16
申请人 TOKYO ELECTRON LIMITED 发明人 OTA YOSHIHARU;TATEYAMA KIYOHISA;ARAKI SHINICHIRO;IWASAKI TATSUYA;ANAL NORIYUKI;IWAZU HARUO
分类号 B65G49/00;B65G49/06;H01L21/00;H01L21/673;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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