发明名称 WORK MOVING TYPE REACTIVE SPUTTERING DEVICE, AND ITS METHOD
摘要 PROBLEM TO BE SOLVED: To improve reaction to the difference in the size of a CRT mount truck, to eliminate the necessity of changing the gas, and to prevent the transfer time of the CRT truck from being increased by the presence of the gas changing time in a work moving type (carrying truck in-line system) reactive sputtering device in which a plurality of process parts are continuously provided via a separation part, an independent gas atmosphere is formed in each process part, and different films are formed through the sputtering. SOLUTION: A separation gas curtain is formed by providing a means 5 to feed the separation gas, for example, the inert gas of Ar gas in a substantially perpendicular direction, and separation is implemented between the discharge gas atmospheres in processes 2A, 2B by arranging a screen-like shield 8 in a separation part 3, the independent sputtering is implemented in the respective process parts 2A, 2B in this condition, and the movement is implemented between the process parts 2A, 2B of the CRT.
申请公布号 JP2001049432(A) 申请公布日期 2001.02.20
申请号 JP19990218490 申请日期 1999.08.02
申请人 SONY CORP 发明人 SUMIDA KOSEI;ARAKI MUNEYA
分类号 H01J9/46;C23C14/34;H01J9/20;(IPC1-7):C23C14/34 主分类号 H01J9/46
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