发明名称 LOAD LOCK CHAMBER OF ION IMPLANTATION DEVICE
摘要 PURPOSE: A load lock chamber is to prevent an O-ring from being scratched due to opening/closing of a door and to increase a process productivity and reliability by applying horizontal and vertical movement to the door together. CONSTITUTION: A load lock chamber of an ion implantation device comprises: a main body(11); a frame(13) connected to a front side of the main body and having an O-ring for maintaining vacuum in the frame; a door(15) for opening and closing the main body to carry in and out a wafer cassette; a cylinder(17) and a roller(19) for moving the door vertically; and a unit connected to the cylinder for horizontally moving the door to prevent damage of the O-ring. Preferably, the unit for horizontally moving the door may be a cylinder(21) or a gear. The door is advanced in a predetermined distance horizontally from the frame by the cylinder. Then, the door is moved downwards vertically by the cylinder and the roller to be opened. After the door is opened, a wafer cassette is carried in the main body and loaded.
申请公布号 KR20010010824(A) 申请公布日期 2001.02.15
申请号 KR19990029923 申请日期 1999.07.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, GEUM SIK
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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