发明名称 |
LOAD LOCK CHAMBER OF ION IMPLANTATION DEVICE |
摘要 |
PURPOSE: A load lock chamber is to prevent an O-ring from being scratched due to opening/closing of a door and to increase a process productivity and reliability by applying horizontal and vertical movement to the door together. CONSTITUTION: A load lock chamber of an ion implantation device comprises: a main body(11); a frame(13) connected to a front side of the main body and having an O-ring for maintaining vacuum in the frame; a door(15) for opening and closing the main body to carry in and out a wafer cassette; a cylinder(17) and a roller(19) for moving the door vertically; and a unit connected to the cylinder for horizontally moving the door to prevent damage of the O-ring. Preferably, the unit for horizontally moving the door may be a cylinder(21) or a gear. The door is advanced in a predetermined distance horizontally from the frame by the cylinder. Then, the door is moved downwards vertically by the cylinder and the roller to be opened. After the door is opened, a wafer cassette is carried in the main body and loaded.
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申请公布号 |
KR20010010824(A) |
申请公布日期 |
2001.02.15 |
申请号 |
KR19990029923 |
申请日期 |
1999.07.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, GEUM SIK |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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