| 摘要 |
The invention relates to a lighting system for a projection lighting system that comprises: a light source (1) that emits light of wavelengths of </= 193 nm, especially wavelengths between 10 nm and 20 nm; a collector unit (30, 32) for illuminating a mirror device that produces secondary light sources (14), said mirror device comprising at least one mirror (34) that is subdivided into grid elements (10, 40, 42, 100, 102); a diaphragm plane (16); one or more optical elements (36, 38) that represent the diaphragm plane (16) in the exit pupil (390) of the lighting system; an object plane (39) in which the images of the grid elements are substantially in line and illuminate a predetermined field with an intensity distribution; an optical element (30, 310, 320, 330) that produces an intensity distribution in the exit pupil (390) that is defined by the kind and/or filling degree, said kind and/or filling degree of the intensity distribution being modifiable by exchanging, displacing or deforming the optical element (30, 310, 320, 330). |
