| 摘要 |
<p>An exposure system (10) comprises a beam monitor for observing the power of a laser source (16), an integrator sensor (46) for detecting the illuminance on a substrate (W), a reflection monitor (47) for observing the reflection from the substrate, and a photosensor (59) for measuring the irradiation on the substrate. The laser source (16) generates short-wavelength laser of 200 nm or shorter, and the photosensor includes a photodetector made of metal nitride containing any of indium, gallium and aluminum. The photosensor has increased durability and allows highly precise exposure operation to remain for a long time.</p> |
