发明名称 CHEMICAL AMPLIFICATION SERIES POSITIVE TYPE RESIST
摘要 PROBLEM TO BE SOLVED: To prevent a resist pattern from being T-shape and to improve resolution by adding a phthalic acid derivative as a plasticizer thereto. SOLUTION: A chemical amplification series positive type resist contains at least a base resin of a polyhydroxy styrene resin with t-BOC group as a protective group and an optical acid generating agent and further the phthalic acid derivative is added thereto as the plasticizer. The polyhydroxy styrene resin having 8,000 to 30,000 weight average molecular weight can be used and the phthalic acid derivative expressed by formula can be used. In formula, R1 and R2 denote 1-11C linear or branched alkyl group and may be the same or different. Preferable addition quantity of the phthalic acid derivative as the plasticizer is 1 to 10 pts.wt. per 100 pts.wt. of the base resin. As the optical acid generating agent, one selected among triphenylsulfonium trifluoromethane sulfonic acid, onium salts or the like can be used.
申请公布号 JP2001027809(A) 申请公布日期 2001.01.30
申请号 JP19990199273 申请日期 1999.07.13
申请人 NEC CORP 发明人 ITANI TOSHIRO
分类号 H01L21/027;G03F7/004;G03F7/039 主分类号 H01L21/027
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