| 摘要 |
A radiation-sensitive resin composition which comprises,(A) a polymer containing,(a) a recurring unit (I) of the following formula (1): or a recurring unit (I) of the formula (1) and a recurring unit (II) of the following formula (2), and(b) a recurring unit (III) which is derived from a monomer having at least two polymerizable carbon-carbon double bonds by cleavage of the carbon-carbon double bonds, wherein the monomer has, in addition to said at least two polymerizable carbon-carbon double bonds, at least one acid-decomposable divalent group of the following formula (3) or (4), said at least two polymerizable carbon-carbon double bonds being linked via the least one acid-decomposable divalent group of the formula (3) or (4), and(B) a photoacid generator.
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