| 摘要 |
The substrate washing apparatus of the present invention comprises a film scrub member permeable to liquid, which is moved relatively to a substrate held substantially horizontally while being in contact with the substrate, a supporting portion for supplying the film scrub member, a supply pipe for supplying a cleaning liquid to the substrate through the film scrub member, cleaning liquid supply means for supplying the cleaning liquid to the supply pipe, pressing means for pressing the film scrub member supplied with the cleaning liquid and swollen, to the substrate, and relative moving means for horizontally moving the film scrub member supplied with the cleaning liquid and swollen, relative to the substrate.
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