发明名称 Shadow mask for cathode ray tube having non-symmetrical through-holes
摘要 A shadow mask for a cathode ray tube includes through-holes defined by first and second recessed formed at first and second surfaces of the shadow mask, respectively. Each through-hole has a first wall farther away from a center of the shadow mask than a second wall thereof. The second recess has a smaller size than that of the first recess. The first wall is formed of a first wall portion defined by an inner surface of the first recess and a second wall portion defined by an inner surface of the second recess. The second wall portion of through-holes located at a peripheral region of the first region has a configuration such that electron beams reflected therefrom are directed to an inner surface of the first recess to thereby reduce electron beams reflected therefrom in directions different from a direction in which the electron beams are originally directed before the electron beams enter the shadow mask.
申请公布号 US6175185(B1) 申请公布日期 2001.01.16
申请号 US19980028658 申请日期 1998.02.24
申请人 NEC CORPORATION 发明人 AIBARA NOBUMITSU
分类号 H01J9/14;H01J29/07;(IPC1-7):H01J29/80 主分类号 H01J9/14
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