| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film magnetic head suited of low lifting values by controlling the head liftable quantity to a disc peripheral velocity with different depths and cross sectional shapes of steps in a rail pattern of two steps formed on a lifting surface. SOLUTION: A bar is coated with a resist to form a desired resist pattern by the exposure phenomenon, a rail pattern is formed by ion milling, and the remaining resist is removed to form rail patterns 1, 2, 3. The step depths of the patterns 1, 2, 3 are measured, a resist is coated thereon to form a desired resist pattern by the exposure phenomenon. The etching condition at ion milling is set such that the etching time is selected from the measurement result of step depths so that the lifting quantity of a thin film magnetic head is optimum. The resist remaining after forming the rail patterns is removed to form a rail pattern 5.
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