| 摘要 |
A slurry circulation line 2 is connected to an inlet and an outlet of a slurry feed unit 1. Slurry inside the slurry circulation line 2 is subjected to ultrasonic waves generated by an ultrasonic wave oscillator 3 to thereby break up large aggregated particles. Piping 10 connects the slurry circulation line 2 to a point of use 5 (e.g. a chemical-mechanical polishing device). Two pumps 6 and 7 respectively circulate slurry around the circulation line 2 and conduct slurry from the circulation line 2 to the point of use 5 via the piping 10. The piping 10 is connected to the slurry circulation line 2 downstream from the ultrasonic wave oscillator 3. A filter 4 and a valve 7 may be provided in the piping 10. The slurry may contain silica.
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