发明名称 Method of making a sputtering target
摘要 <p>There is provided a method of making a high-melting metal powder which has high purity and excellent formability and, particularly, of a metal powder of spherical particles made of Ta, Ru, etc. having a higher melting point than iron. There is also provided a target of high-melting metal or its alloy, which is made by the sintering under pressure of these powders and which has high purity and a low oxygen concentration and shows high density and a fine and uniform structure. A powder metal material mainly composed of a high-melting metal material is introduced into a thermal plasma into which hydrogen gas has been introduced, thereby to accomplish refining and spheroidizing. Further, an obtained powder is pressed under pressure by hot isostatic pressing, etc.</p>
申请公布号 EP1066899(A2) 申请公布日期 2001.01.10
申请号 EP20000114459 申请日期 2000.07.05
申请人 HITACHI METALS, LTD. 发明人 HAN, GANG;MURATA, HIDEO;NAKAMURA, HIDEKI
分类号 B22F9/14;B22F1/00;B22F3/105;B22F3/14;B22F3/15;C22C1/04;C23C14/34;(IPC1-7):B22F1/00 主分类号 B22F9/14
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