发明名称 Substrate processing apparatus
摘要 A substrate processing apparatus comprising a substrate mounting table, a cup having an upper opening and surrounding the substrate mounting table, a lid for opening/closing the upper opening of the cup, a support arm for supporting the lid, a first lifting mechanism having a first piston for supporting the support arm directly or indirectly and a first cylinder for guiding the first piston in an up-and-down motion, a second lifting mechanism having a second piston for supporting the support arm directly or indirectly and a second cylinder for guiding the second piston in up-and -down motion, a driving circuit for supplying the pressurized fluid to the first and second cylinders, independently and exhausting the pressurized fluid from the first and second cylinders, independently, and a control mechanism for controlling operations of the driving circuit.
申请公布号 US6168665(B1) 申请公布日期 2001.01.02
申请号 US19980185503 申请日期 1998.11.04
申请人 TOKYO ELECTRON LIMITED 发明人 SAKAI MITSUHIRO;TATEYAMA KIYOHISA;MOTODA KIMIO
分类号 B05C11/08;H01L21/00;(IPC1-7):B05C21/00;B05C11/00 主分类号 B05C11/08
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