| 摘要 |
<p>Characterization of an optical system (18) is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space (20). A reticle (16) and image plane (22) are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets (116a-e) thereon, including periodic patterns or gratings (216a-e), is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations may be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space. <IMAGE></p> |
