Erosion profile compensated magnetron with moving magnet assembly

摘要

A magnetron including a target (2) for sputtering onto a substrate is described. The magnetron comprsises a magnetic field generator (4) for generating a closed loop magnetic field adapted to generate a plasma race-track above the target (2) and a driving device for establishing relative substantially translational movement between the race-track and the target (2). One or more pieces (50) of ferromagnetic material are fixed with respect to the target (2) and adapted to influence the magnetic field generated by the magnetic field generator (4) at least during part of the relative substantially translational movement, the distance between any point on the race track and the momentarily closest part of the one or more pieces (50) of ferromagnetic material varying in accordance with the relative substantially translational movement of the race-track and the target (2). <IMAGE>