发明名称 |
Method and apparatus for overlay measurement |
摘要 |
<p>A process for measuring the alignment of different layers on a semiconductor wafer (33) includes forming repetitive alignment marks (14, 24) having substantially the same period on the different layers on the wafer (33). The images of the overlay alignment marks (14, 24) are converted from space domain to frequency domain through Fourier transformations. The alignment measurements are performed by calculating the phase difference between the images corresponding to the repetitive patterns (14, 24) on different layers. <IMAGE></p> |
申请公布号 |
EP1061417(A2) |
申请公布日期 |
2000.12.20 |
申请号 |
EP20000112776 |
申请日期 |
2000.06.16 |
申请人 |
INFINEON TECHNOLOGIES AG;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GOULD, CHRIS;MULLER, PAUL K.;PRAKASH, JAI V.C.;VAN DEN BERG, ROBERT |
分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;H01L21/66;H05K3/46;(IPC1-7):G03F7/20 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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