VACUUM PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To obtain a vacuum processing apparatus having an excellent maintainability. SOLUTION: In the vacuum processing apparatus for performing plasma etching on a substrate 5 mounted on a work mount within a processing chamber 11 provided on a base 1a, a lid member 10 vertically moved by a cylinder 14 to define the chamber 11 as tightly contacted with the base 1a is supported from its upper side by a frame 15, and a move table 20 as a transportation means for a substrate 5 is positioned between a support column 15a of the frame 15 and the lid member 10. As a result, a front side of the vacuum processing apparatus can be secured as an free-accessible work space and its maintainability can be improved.