COATING FILM FORMING DEVICE, COATING FILM FORMING METHOD AND COATING FILM FORMED MATERIAL

摘要

PROBLEM TO BE SOLVED: To remarkably decrease the influence of oxygen at the time of irradiating a coating film with a radiation such as electron bean to cross-link or cure the coating film. SOLUTION: This coating film forming device 1 is constituted of a coating film forming part 10 for forming the coating film on a base material 2, a radiation exposure part 20 for irradiating the coating film formed on the base material 2 with radiation to crosslink or cure the coating film and an inert gas supply part 30 for supplying inert gas to both coating film forming part 10 and radiation exposure part 20. Both of the coating film forming process and the radiation exposing process are executed in the inert atmosphere by using the coating film forming device 1.