Chemically amplified resist composition and method of creating a patterned resist using electron beam
摘要
The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
申请公布号
EP0932082(A3)
申请公布日期
2000.11.29
申请号
EP19990300525
申请日期
1999.01.25
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BUCCHIGNANO, JAMES J.;HUANG, WU-SONG;KATNANI, AHMAD D.;LEE, KIM Y.;MOREAU, WAYNE M.;PETRILLO, KAREN E.