发明名称 FABRICATION OF INTEGRATED THIN FILM SOLAR CELL AND PATTERNING SYSTEM
摘要 PROBLEM TO BE SOLVED: To enhance characteristics while increasing yield by forming a lower electrode on one major surface of an insulating substrate then removing a part of a semiconductor film or an upper electrode film by making a trench in the outer circumferential part of the part being removed and stripping the part being removed. SOLUTION: A trench is made only in a semiconductor film 92 by means of a trenching tool, e.g. a diamond pin, on the opposite sides of a part being removed using an Mo film as a stopper. The semiconductor film 92 is then stripped from the part being removed by means of a scraper 16, or the like. Subsequently, an upper electrode film is formed to cover the semiconductor film 92 and a lower electrode 91 on an insulating substrate 90 exposed by removing the semiconductor film 92. That film is connected electrically with the lower electrode 91 through a split part of the semiconductor film 92. Subsequently, the semiconductor film 92 and the upper electrode film are removed partially in stripe and split into stripe. An integrated solar cell is formed by making a trench only in the semiconductor film 92 and the upper electrode film and the upper electrode film of each cell unit is connected in series with the lower electrode 91 of an adjacent unit cell.
申请公布号 JP2000315809(A) 申请公布日期 2000.11.14
申请号 JP19990281845 申请日期 1999.10.01
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SHIMAKAWA SHINICHI;MURO SHINKO;NEGAMI TAKAYUKI;TAKAHASHI MASAYUKI;KITAGAWA MASATOSHI
分类号 H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L31/04
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