METHOD AND EQUIPMENT FOR WIDING UP TYPE VACUUM DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a wrinkle-less long-size substrate having a dense film and free from damage by electric discharge while preventing the electrification of the long-size substrate by using an electron beam evapora tion source and also to provide equipment suited to the execution of this method. SOLUTION: An evaporation material 11 from an electron beam evaporation source 14 is vapor deposited onto a long-size dielectric substrate 8 moving through a vacuum film deposition chamber 1 by a winding means 7. In the above vacuum evaporation method, an electric potential is applied to an electrode 15 disposed in the vicinity of the electron beam evaporation source to permit it to discharge electricity, and the evaporation material passing through the resultant electric discharge region is positively ionized and vapor deposited onto the long-size substrate to electrically neutralize the secondary electrons generated from the evaporation material negatively charged on the long-size substrate. The electrode connected to a discharge power source 17 and used for forming the electric discharge region for positively ionizing the evaporation material evaporated from the electron beam evaporation source is provided to the vicinity of the electron beam evaporation source.