发明名称 ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device capable of uniformly irradiating the subject of sterilization with electron beams without being affected by the shape of the subject of irradiation. SOLUTION: Electron beams emitted by a source of electron beams irradiate the subject of irradiation 15 after passing through a dose adjuster 10. The dose adjuster 10 is constructed so that absorption rate values showing the rate of absorption when the electron beams pass through it are constant at all points on the subject of irradiation 15 along a direction perpendicular to the direction of irradiation of the electron beams. Thus, since the total of the dose absorbed by the dose adjuster 10 and the dose absorbed by the subject of irradiation 15 is constant at each point on the subject of irradiation 15, the subject of irradiation 15 is irradiated with a uniform dose of electron beams regardless of its shape.
申请公布号 JP2000312708(A) 申请公布日期 2000.11.14
申请号 JP19990124109 申请日期 1999.04.30
申请人 NKK PLANT ENGINEERING CORP 发明人 DOI TAKESHI
分类号 H01J37/30;A61L2/08;G21K5/04 主分类号 H01J37/30
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