| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pellicle for lithography having high light transmittance to fluorine excimer laser and such light resistance that the pellicle withstands practical use by using a specified amorphous fluorine-containing copolymer as the material of a pellicle film. SOLUTION: An amorphous fluorine-containing copolymer obtained by copolymerizing a fluorine-containing radical polymerizable monomer mixture including 70-100 mol% perfluoro-2,2,-dimethyl-1,3-dioxol is used as the material of a pellicle film. Tetrafluoroethylene, trifluoroethylene, difluoroethylene, vinylidene fluoride or hexafluoropropylene may be used as a fluorine-containing radical polymerizable monomer copolymerizable with the perfluoro-2,2,- dimethyl-1, 3-dioxol but tetrafluoroethylene is preferably used. The preferred content of the perfluoro-2,2,-dimethyl-1,3-dioxol in the mixture is 85-100 mol%.</p> |
