| 摘要 |
PROBLEM TO BE SOLVED: To form a good image of a master pattern on a substrate by providing an interference system for measuring the positional information of a mask stage and an interference system for measuring the positional information of a substrate stage using specific five measuring axes. SOLUTION: In a projection aligner for scan-exposing a substrate by moving a mask R in the first direction and at the same time by moving a substrate W in the second direction, the position of a reticule stage RST in the scan direction is always detected with a resolution, e.g. of about 0.01μm by an interferometer 19. The interferometer 19 is constructed of five interferometers including two X-interferometers for measuring the position in the X-direction, two Y-interferometers, and an alignment interferometer passing through a center OAc of an observation region OA of an off-axis alignment system and having an optical axis in the Y-direction. |
