PATTERN FORMING METHOD, ELECTRON BEAM EMISSION ELEMENT AND ITS MANUFACTURE

摘要

PROBLEM TO BE SOLVED: To obtain a pattern forming method which facilitates application of an electron beam lithography technique, and to obtain an electron beam emission element used for the method and a manufacturing method therefor. SOLUTION: This pattern forming method includes a process wherein an electron beam emission element 10 having at least one pyramid part 18 whose surface is made of diamond is prepared; a process wherein an electron beam 19 is emitted from the pyramid part 18 to expose an electron beam sensitive resist layer 22 by applying a voltage; and a process wherein a portion of the resist layer 22 is removed to execute patterning.