| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment method and device for reducing the load of a heating means, and for preventing the generation of bacteria in processing solution. SOLUTION: Pure water in a pure water storage tank 80 is heated to a prescribed temperature, and this pure water and chemicals is packed in a cleaning bath 60, and a wafer W is immersed so that the wafer W can be cleaned in chemicals. In this case, the pure water is supplied and stored in the pure water storage tank 80 while the heating of the pure water is stopped, and the pure water at a small flow rate is continuously supplied, and the pure water is discharged from the pure water storage tank 80 through an overflow tube 82, and the pure water stored in the pure water storage tank 80 is allowed to flow at all times. The supply and discharge of the pure water is stopped a prescribed time, before a time to start the packing in the cleaning bath 60, and a cartridge heater 95 is operated.
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