| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask which can secure the accuracy of consecutiveness of patterns while suppressing the mask size to an irreducible min. SOLUTION: This transfer mask consists of a membrane 1 where the pattern to be transferred to a sensitive substrate is formed and supports 2 to divide the membrane into a plurality of rectangular regions. In the rectangular region, small regions 3 as a plurality of pattern regions are arranged in the longitudinal direction with a nonpattern region 4 arranged between the small regions. The nonpattern region has 1 to 50 μm width. |
