发明名称 SPUTTERING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the height f a rotary member without deteriorating the performance and to reduce the occupancy region. SOLUTION: As to this sputtering device, in a sputtering device having a magnet rotating mechanism arranged at the back face side of a target in a vacuum vessel and for generating the magnetic flux, a driving motor 31, a rotary member 33 combining a speed reducing performance and connected to the driving motor 31 and a magnet 38 fitted to the rotary member 33 via a magnet fitting board 39 are provided, and, the rotary member 33 is composed of a ring-shaped gear 34 fitted to the magnet fitting board 39, and in which the engaging part is formed at the inside face and a pinion 35 engaged with the engaging part of the gear 34 and furthermore connected with the output shaft 32.
申请公布号 JP2000282236(A) 申请公布日期 2000.10.10
申请号 JP19990094012 申请日期 1999.03.31
申请人 SHIBAURA MECHATRONICS CORP 发明人 TAKAGI SHINICHIRO;KAWASHIMA TAKESHI
分类号 C23C14/35;(IPC1-7):C23C14/35 主分类号 C23C14/35
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