发明名称 VERFAHREN ZUM HERSTELLEN VON VORFORMEN FÜR OPTISCHE FASERN
摘要 A precision burner suitable for oxidizing halide-free, silicon-containing compounds, such as octamethylcyclotetrasiloxane (OMCTS), is provided. The burner may include a subassembly (13) which can be precisely mounted on a burner mounting block (107) through the use of an alignment stub (158), a raised face (162) on the burner mounting block (107) and corresponding recess (160) in the back of the subassembly (13). Disclosed and claimed is an apparatus suitable for producing SiO2 containing soot, the apparatus comprising a burner having a burner face. The burner's face includes four concentric regions each for emitting a gas: a first central region (36,90) suitable for emitting a mixture of OMCTS and O2, a second innershield region (38,92) suitable for emitting N2, a third outershield region (40,42,94,96) suitable for emitting O2, and a fourth premix region (44,98) suitable for premissing and emitting a mixture of CH4 and O2. The burner provides more efficient use of halide-free silicon-containing raw materials than prior art burners. <IMAGE>
申请公布号 DE69518092(D1) 申请公布日期 2000.08.24
申请号 DE1995618092 申请日期 1995.12.19
申请人 CORNING INC., CORNING 发明人 CAIN, B.;DESORCIE, ROBERT B.;KIEFER, J.;POWERS, R.
分类号 F23D14/38;C03B8/04;C03B19/14;C03B37/014;C03B37/018;C23C16/453;F23D14/02;F23D14/22;F23D14/32;F23G7/06;F23L7/00 主分类号 F23D14/38
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