发明名称 |
Planarization process and apparatus for the etch definition of magnetic head air bearing surfaces |
摘要 |
A method of processing an assembly to prepare the assembly for etch patterning, the assembly including a row or bar mounted on a substrate, the row or bar bordered by a recess, the method including placing the assembly within a frame; applying a contiguous adhesive film across said assembly and said frame; depositing a fluid in said frame, said fluid forming in said recess; and removing said contiguous adhesive film.
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申请公布号 |
US6106736(A) |
申请公布日期 |
2000.08.22 |
申请号 |
US19970923791 |
申请日期 |
1997.09.04 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LEVAN, DIEN;MILLER, ROBERT DENNIS;NAZZAL, ADEL ISSA;TING, ANDREW CHIUYAN |
分类号 |
C23F1/02;G11B5/10;G11B5/31;G11B5/60;(IPC1-7):B44C1/22 |
主分类号 |
C23F1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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