发明名称 Planarization process and apparatus for the etch definition of magnetic head air bearing surfaces
摘要 A method of processing an assembly to prepare the assembly for etch patterning, the assembly including a row or bar mounted on a substrate, the row or bar bordered by a recess, the method including placing the assembly within a frame; applying a contiguous adhesive film across said assembly and said frame; depositing a fluid in said frame, said fluid forming in said recess; and removing said contiguous adhesive film.
申请公布号 US6106736(A) 申请公布日期 2000.08.22
申请号 US19970923791 申请日期 1997.09.04
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LEVAN, DIEN;MILLER, ROBERT DENNIS;NAZZAL, ADEL ISSA;TING, ANDREW CHIUYAN
分类号 C23F1/02;G11B5/10;G11B5/31;G11B5/60;(IPC1-7):B44C1/22 主分类号 C23F1/02
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