发明名称 PROJECTION ALIGNER
摘要 PROBLEM TO BE SOLVED: To suppress vibrations with synchronous moves of a reticle or a wafer and avoid deteriorating the image forming characteristics. SOLUTION: A reticle stage RS holding a reticle R is disposed at the downside, a wafer stage WS holding a wafer W is disposed at the upside, illumination optical systems 21-23 introduce illumination lights IL from the downside, a rigid member 25 is rotatably provided on a base 11 adjacent to the apparatus body 10, and the reactions due to driving of the stages RS, WS are transmitted to this member 25 through transmitting means 27, 28 and mutually cancelled through the member 25.
申请公布号 JP2000216084(A) 申请公布日期 2000.08.04
申请号 JP19990325520 申请日期 1999.11.16
申请人 NIKON CORP 发明人 RI SEIBUN
分类号 H01L21/027;F16F15/02;G03F7/23;G05D3/00;G05D3/12;(IPC1-7):H01L21/027 主分类号 H01L21/027
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