| 摘要 |
PROBLEM TO BE SOLVED: To attain tight bonding of ultrafine particles to a substrate or to one other even at a low velocity of a flow of the ultrafine particles and to form a coating by irradiating the ultrafine particles and the substrate with high-speed energy beams and removing a contaminant layer and an oxide layer due to water molecules or the like sticking to the surfaces of the ultrafine particles and the substrate or forming an amorphous state to activate the surfaces without melting or decomposing the material of the ultrafine particles. SOLUTION: Prior to the collision of a flow 5 of ultrafine particles with a substrate 1 in a vacuum chamber 20, the ultrafine particles and the substrate are irradiated with high-speed high-energy beams as high-energy atoms and molecules such as ions, atoms, molecules or low temperature plasma to activate the surfaces of the ultrafine particles and the substrate without causing melting. The bonding of the ultrafine particles to the substrate or to one another is promoted and a deposit having physical properties as a dense good film and good adhesion to the substrate is formed while retaining the crystallinity of the ultrafine particles.
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