THE METHOD OF MANUFACTURING TARGET MADE OF ITO FOR VACUUM DEPOSITION

摘要

PURPOSE: A method for manufacturing ITO (In2O3-SnO2) target for vacuum vapor deposition is provided to produce an ITO (In2O3-SnO2) target having superior transparency to visible light that is applied to liquid crystal display or solar cell through detonation flame spraying method convenient in comparison with conventional ceramic sintering method. CONSTITUTION: To accomplished abovementioned purpose, In2O3 and SnO2 powder having a particle size distribution of 10 to 20μm is spayed on the surface of blasted copper plate at 900m/s by using detonation flame spraying method.