发明名称 ELECTRONIC CYCLOTRON RESONANCE PLASMA SPUTTERING DEVICE, AND MANUFACTURE OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a multi-target device without increasing the size or complicating the shape of the device by providing a rotatable shield plate on the inner surface side of a cylindrical target formed by combining a plurality of targets. SOLUTION: A cylindrical target 11 comprises a backing plate 13 formed in polygonal shape, and a plurality of approximately rectangular flat targets 14 arranged on an inner surface of the backing plate. The cylindrical target 11 is provided with a plurality of shield plates 15 arranged on its inner surface side in a rotatable manner from the targets 14 keeping the specified distance therebetween. An electronic cyclotron resonance plasma sputtering device is capable of shielding a specified target by the shield plate 15, and achieves its purpose, forms a thin film which is uniform and high in purity on a substrate by appropriately controlling the rotation of the shield plate 15, and easily forms a multi-layer thin film having a steep interface or a thin film of functionally gradient material on the substrate with excellent quality.
申请公布号 JP2000199061(A) 申请公布日期 2000.07.18
申请号 JP19990000551 申请日期 1999.01.05
申请人 SONY CORP 发明人 TAMADA SAKUYA
分类号 C23C14/34;C23C14/35;C23C14/56;(IPC1-7):C23C14/35 主分类号 C23C14/34
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