METHOD FOR FABRICATING IMAGE SENSOR

摘要

PURPOSE: A method for fabricating an image sensor is provided to improve light sensitivity against short wavelength light by utilizing a protection film whose reflexibility against light is less. CONSTITUTION: In a method for fabricating an image sensor, an oxide film(31) as a first protection film is formed on a wafer, on which a metal wire(5) is formed, by use of a high density plasma chemical vapor deposition(HDP CVD) method. A spin on glass film(32) as a second protection film is formed on the oxide film(31). A surface(32a) of the spin on glass film(32) is process by an electronic beam.