发明名称 PRODUCTION OF HIGH TRANSPARENT GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a producing method of a metal oxide thin film having uniform film thickness all over the length and good transmittance, water vapor barrier property and oxygen barrier property when the film is formed on a polymer film by sputtering. SOLUTION: When a metal oxide layer is formed by sputtering on a polymer film, the metal oxide film consists of at least one kind of oxide selected from silicon oxide, aluminum oxide and magnesium oxide. The partial pressure of water in the film forming atmosphere is controlled to between >=1×10-5 Torr and <=2×10-4 Torr, or the total partial pressure of water and oxygen in the film forming atmosphere is controlled to between >=1×10-5 Torr and <=2×10-4 Torr.
申请公布号 JP2000192237(A) 申请公布日期 2000.07.11
申请号 JP19980369807 申请日期 1998.12.25
申请人 TEIJIN LTD 发明人 TSUBOI SEIJI;HACHIMAN KAZUO;HARA HIROSHI;TAMURA YUUJI
分类号 C08J7/04;B32B9/00;C23C14/08;C23C14/34;(IPC1-7):C23C14/34 主分类号 C08J7/04
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