发明名称 MEASURE DEVICE
摘要 PURPOSE: A measure device is provided to determine a temperature of a wafer surface exactly and reliably, and to determine a temperature to different chamber and/or chuck structures. CONSTITUTION: A device for measuring a process parameter at a proper position comprises a process chip(12) which is formed on a semiconductor wafer. The process chip(12) consists of a temperature sensor(26), a memory storage device(24), a clock(28) as a timing device and a power supply(20). The temperature sensor(26) measures the process parameter, and the memory storage device(24) stores the process parameter when the sensor measures the process parameter. The timing device(28) tracks the process parameter as a function of time, and the power supply(20) supplies a power to the sensor, the memory storage device, and the timing device through a filter(22).
申请公布号 KR20000035491(A) 申请公布日期 2000.06.26
申请号 KR19990050783 申请日期 1999.11.16
申请人 SIEMENS AKTIENGESELLSCHAFT;INTERNATIONAL BUSINESS MACHINES CORPORATION. 发明人 PLLITNER VERTRANT;MILLER K. PAUL
分类号 G05B19/00;G05D23/00;H01L21/66;H01L23/544;(IPC1-7):H01L21/66 主分类号 G05B19/00
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