ELECTRODE PLATE OF PLASMA ETCHING APPARATUS

摘要

PURPOSE: An electrode plate of a plasma etching apparatus is provided to form a uniform etching plane regardless of a thickness of an etching plate to be etched. CONSTITUTION: An electrode plate of a plasma etching apparatus comprises a plurality of vertical through fine holes. The electrode plate is disposed so as to be opposed to an etching plane and to be spaced apart from the etching plane. The electrode plate consists of a high purity silicon which has a casting structure formed by one-direction solidification perpendicular to the etching plane. Etching gas is spouted from the vertical through fine holes.