发明名称 FLOATING APPARATUS OF SUBSTRATE
摘要 <p>It is an object of the present invention to provide a substrate body floating apparatus which insures a stable floating state of a substrate body with less vibration of a rotation axis or a surface thereof and a heater and a film-forming apparatus capable of forming a homogeneous film without losing cleanliness of a surface of a substrate body and with small temperature gradation on a surface of a substrate body as well as small density gradation of a raw material used for forming a film on a substrate body in a wide area. The substrate body floating apparatus according to the present invention has a floating unit for floating and rotating a disk-shaped substrate body by blowing an air flow to a rear surface of the substrate body, said floating unit comprising a group of fine pores for floating the substrate body, a group of fine pores for fixing the substrate body at a center of the apparatus, a group of fine pores for rotating the substrate body at a center of the apparatus, and a group of auxiliary fine pores for suppressing vibration of the substrate body when the substrate body is rotated at a high speed. Also the substrate body floating type of heater and film-forming apparatus have the floating unit described above respectively. &lt;IMAGE&gt;</p>
申请公布号 EP1005076(A1) 申请公布日期 2000.05.31
申请号 EP19980907223 申请日期 1998.03.13
申请人 KABUSHIKI KAISHA WATANABE SHOKO;TODA, MASAYUKI 发明人 TODA, MASAYUKI;UMEDA, MASARU;KANNO, YOICHI;OHMI, TADAHIRO
分类号 B23Q3/08;H01L21/205;H01L21/683;(IPC1-7):H01L21/68 主分类号 B23Q3/08
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