发明名称 |
FLOATING APPARATUS OF SUBSTRATE |
摘要 |
<p>It is an object of the present invention to provide a substrate body floating apparatus which insures a stable floating state of a substrate body with less vibration of a rotation axis or a surface thereof and a heater and a film-forming apparatus capable of forming a homogeneous film without losing cleanliness of a surface of a substrate body and with small temperature gradation on a surface of a substrate body as well as small density gradation of a raw material used for forming a film on a substrate body in a wide area. The substrate body floating apparatus according to the present invention has a floating unit for floating and rotating a disk-shaped substrate body by blowing an air flow to a rear surface of the substrate body, said floating unit comprising a group of fine pores for floating the substrate body, a group of fine pores for fixing the substrate body at a center of the apparatus, a group of fine pores for rotating the substrate body at a center of the apparatus, and a group of auxiliary fine pores for suppressing vibration of the substrate body when the substrate body is rotated at a high speed. Also the substrate body floating type of heater and film-forming apparatus have the floating unit described above respectively. <IMAGE></p> |
申请公布号 |
EP1005076(A1) |
申请公布日期 |
2000.05.31 |
申请号 |
EP19980907223 |
申请日期 |
1998.03.13 |
申请人 |
KABUSHIKI KAISHA WATANABE SHOKO;TODA, MASAYUKI |
发明人 |
TODA, MASAYUKI;UMEDA, MASARU;KANNO, YOICHI;OHMI, TADAHIRO |
分类号 |
B23Q3/08;H01L21/205;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
B23Q3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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