发明名称 |
Method for deposition tool cleaning |
摘要 |
A method of cleaning a deposition tool to control and minimize emission of environmentally deleterious materials includes the steps of: a) establishing a predetermined temperature in a processing chamber; b) providing a mixture of between 15 and 25 percent nitrogen trifluoride in helium at a mixture flow rate of more than 550 standard cubic centimeters per minute (sccm); c) establishing a high pressure of 1.5 to 9.5 torr in the processing chamber; d) establishing a plasma in the processing chamber, e) establishing a low pressure in the processing chamber of 2 torr or less; and f) establishing a plasma in the processing chamber. Instead of a two-step cleaning method, the method may alternatively be executed as a one-step cleaning method. Either method may be optimized by, among other things, providing 19% nitrogen trifluoride. The two-step method may also be optimized by providing a high pressure of about 7 to 9.5 torr and a low pressure of about 1.5 torr.
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申请公布号 |
US6067999(A) |
申请公布日期 |
2000.05.30 |
申请号 |
US19980065798 |
申请日期 |
1998.04.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HINES, CYNTHIA MARIE;PINTO, JAMES NICHOLAS |
分类号 |
C23C16/44;(IPC1-7):G08B6/00 |
主分类号 |
C23C16/44 |
代理机构 |
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主权项 |
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地址 |
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