RESIST MASK REMOVING METHOD AND APPARATUS THEREFOR, TRANSISTOR AND LIQUID CRYSTAL PANEL MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of removing a resist mask, which does not require chemicals to be used and a large of cost and can surely remove a residue of the resist mask in a contact hole and a resist mask after introduction of impurity within a short period of time, a method of manufacturing transistor and a liquid crystal panel using the same method and a resist mask removing apparatus. SOLUTION: On the occasion of removing a resist mask formed on a substrate, after the resist mask is decomposed through irradiation of the plasma 340 from a plasma gun 370 to the substrate P under the atmospheric condition within the plasma radiating chamber of the resist removing apparatus 1, residue of the resist mask is washed out from the substrate P with water.